MS-4697/EP/DT - Supply of a Hybrid Physical Chemical Vapour Deposition Machine using a Reactive Pulsed Magnetron Sputtering Process

This Technical Description concerns the supply, installation, testing and commissioning of one hybrid physical chemical vapour deposition machine using a reactive pulsed magnetron sputtering deposition process. This Market Survey will be followed by an Invitation to Tender that is planned to be issued in Q3 2021.